Laminar-type Replica Diffraction Gratings for Soft X-ray Region
- Aberration-corrected Laminar-type Replica Diffraction Gratings for flat-field Polychromators in the range of Extreme Ultra-Violet Light(EUV:13nm). Suitable for the next generation of semiconductor lithography.
- Less high order light due to laminar type grooves configuration, Low stray light by holographic manufacturing technology, and high resolution from aspherical waves exposure method .
- Easy to design spectrometers with array-type detectors.
- Suitable for monitoring EUV lights as well as for Emission Spectroscopy
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